Detailed Notes on Noohapou
Detailed Notes on Noohapou
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Remote destinations: Static units are usually positioned remotely, raising Price tag and lowering Total method efficiency.
Software & TCU software package calibration procedures fluctuate external check products not used frequently for verifying
the data down below is classified by semiconductor method and tool manufacturer. Every desk includes an Applications Matrix that exhibits qulified and industrial processes.
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LAUDA-Noah will, for the consumer's retrofit analysis, keep an eye on and modify its fluid temperature Command profiles to match an present TCUs' so as to guarantee a clean process integration via DAQ.
The precision of your POU 3300 permits independent control of the procedure fluid temperature into the wafer chuck inside of +/- 0.one °C of set position, as well as the speedy reaction time from the method permits for optimum wafer-to-wafer repeatability through the etch process.
All static TCUs have to have excess cooling & heating capacities because here of their very massive process fluid reservoirs. the method fuid reservoir on LAUDA-Noah's dynamic temperature Regulate system is a lot less than 1 gallon.
With our device strategically mounted somewhere around six ft through the chamber, we realize a way more correct reading through of the chuck temperature. This approach makes certain steady temperature through the entire production great deal, resulting in improved wafer-to-wafer CD uniformity.
the info pertains to some 300mm chamber temperature profile throughout a significant aspect ratio Etch approach, working at pretty significant RF electrical power problems (~three.8kW). The persuasive elements of this data set are:
LAUDA-Noah is Assembly these new difficulties and has integrated energy preserving know-how in programs that are pleasant into the setting and also have a cheap to function.
The data set here is from a 200mm volume production wafer fab and Obviously illustrates the benefit of the LAUDA-Noah POU process.
much more than at any time, shrinking unit geometries, demanding new procedures along with a remarkably aggressive environment have to have temperature Management programs that combine speedy and accurate temperature Regulate using an emphasis on reduced running expenses and improved reliability.
verified; TEs' characterize just one Portion of a chiller's design. The switching & control procedures used by a chiller will effects the TEs' trustworthiness.
(Therefore, installing a static unit beside chamber won't permit it to offer dynamic temperature Management)
We involve significantly less cooling/heating potential for a similar software as a static TCU due to our smaller reservoir quantity.
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